Kruhlov, Ivan O.Orlov, Andrii K.Dubikovskyi, OleksandrIguchi, YusukeErdélyi, ZoltánSidorenko, S.I.Ishikawa, TestuyaPrikhodko, Sergey V.Voloshko, Svetlana M.2023-06-082023-06-082023Materials Today Communications. -34 (2023), p. 1-9. -Materials Today Communications. - 2352-49282352-4928https://hdl.handle.net/2437/354852Inhibition of interlayer diffusion and reduction of impurities in thin metal films by ion irradiationfolyóiratcikkopen access articlehttps://ebib.lib.unideb.hu/ebib/CorvinaWeb?action=cclfind&resultview=long&ccltext=idno+BIBFORM112433TermészettudományokFizikai tudományokhttps://linkinghub.elsevier.com/retrieve/pii/S2352492822018189http://dx.doi.org/10.1016/j.mtcomm.2022.1049772023-06-0800090733270000785145662814