Effect of process parameters on co-sputtered Al(1-x)ScxN layer`s properties: Morphology, crystal structure, strain, band gap, and piezoelectricity

Khánh, Nguyen QuocHorváth, Zsolt EndreZolnai, ZsoltPetrik, PéterPósa, LászlóVolk, János2024-03-132024-03-132024Materials Science In Semiconductor Processing. -169 (2024), p. 1-9. -Mater. Sci. Semicond. Process. - 1369-80011369-8001https://hdl.handle.net/2437/367462Effect of process parameters on co-sputtered Al(1-x)ScxN layer`s properties: Morphology, crystal structure, strain, band gap, and piezoelectricityfolyóiratcikkopen access articlehttps://ebib.lib.unideb.hu/ebib/CorvinaWeb?action=cclfind&resultview=long&ccltext=idno+BIBFORM119411TermészettudományokFizikai tudományokhttps://linkinghub.elsevier.com/retrieve/pii/S1369800123005954szerzőkhttp://dx.doi.org/10.1016/j.mssp.2023.1079022024-03-1300110168730000185173804404