Characterization and Quality Control of Aluminium-Oxide Layers Prepared by Atomic Layer Deposition

Abstract

In this thesis, the deposition temperature effects on thin films produced using Atomic Layer deposition (ALD) are studied, as well as some of the most commonly used methods in the university to characterize this films. Additionally, the introduction of Optical microscopy is suggested as a new standard characterization method as it provides information that cannot be obtained with any of the other methods currently used.