Characterization and Quality Control of Aluminium-Oxide Layers Prepared by Atomic Layer Deposition

A tétel rövid nézete
dc.contributor.advisorTomán, János
dc.contributor.advisorErdélyi, Zoltán
dc.contributor.authorGil Rendon, David
dc.contributor.departmentDE--Természettudományi és Technológiai Kar--Fizikai Intézethu_HU
dc.date.accessioned2022-05-05T13:18:55Z
dc.date.available2022-05-05T13:18:55Z
dc.date.created2022-05-05
dc.description.abstractIn this thesis, the deposition temperature effects on thin films produced using Atomic Layer deposition (ALD) are studied, as well as some of the most commonly used methods in the university to characterize this films. Additionally, the introduction of Optical microscopy is suggested as a new standard characterization method as it provides information that cannot be obtained with any of the other methods currently used.hu_HU
dc.description.coursePhysicshu_HU
dc.description.degreeBSc/BAhu_HU
dc.format.extent41hu_HU
dc.identifier.urihttp://hdl.handle.net/2437/332432
dc.language.isoenhu_HU
dc.subjectAtomic Layer Depositionhu_HU
dc.subjectALDhu_HU
dc.subjectThin Filmhu_HU
dc.subjectThin Film Characterizationhu_HU
dc.subjectOptical Microscopyhu_HU
dc.subject.dspaceDEENK Témalista::Fizikahu_HU
dc.titleCharacterization and Quality Control of Aluminium-Oxide Layers Prepared by Atomic Layer Depositionhu_HU
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Theses (Faculty of Science and Technology)