Characterization and Quality Control of Aluminium-Oxide Layers Prepared by Atomic Layer Deposition
dc.contributor.advisor | Tomán, János | |
dc.contributor.advisor | Erdélyi, Zoltán | |
dc.contributor.author | Gil Rendon, David | |
dc.contributor.department | DE--Természettudományi és Technológiai Kar--Fizikai Intézet | hu_HU |
dc.date.accessioned | 2022-05-05T13:18:55Z | |
dc.date.available | 2022-05-05T13:18:55Z | |
dc.date.created | 2022-05-05 | |
dc.description.abstract | In this thesis, the deposition temperature effects on thin films produced using Atomic Layer deposition (ALD) are studied, as well as some of the most commonly used methods in the university to characterize this films. Additionally, the introduction of Optical microscopy is suggested as a new standard characterization method as it provides information that cannot be obtained with any of the other methods currently used. | hu_HU |
dc.description.course | Physics | hu_HU |
dc.description.degree | BSc/BA | hu_HU |
dc.format.extent | 41 | hu_HU |
dc.identifier.uri | http://hdl.handle.net/2437/332432 | |
dc.language.iso | en | hu_HU |
dc.subject | Atomic Layer Deposition | hu_HU |
dc.subject | ALD | hu_HU |
dc.subject | Thin Film | hu_HU |
dc.subject | Thin Film Characterization | hu_HU |
dc.subject | Optical Microscopy | hu_HU |
dc.subject.dspace | DEENK Témalista::Fizika | hu_HU |
dc.title | Characterization and Quality Control of Aluminium-Oxide Layers Prepared by Atomic Layer Deposition | hu_HU |